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Quasisimultaneous SIMS, AES, and XPS investigations of the oxidation of Mo, Ti, and Co in the monolayer range

Journal Article · · J. Vac. Sci. Technol.; (United States)
DOI:https://doi.org/10.1116/1.569456· OSTI ID:6807186

The oxidation of Mo, Ti, and Co at oxygen exposures up to several hundred Langmuirs has been investigated by combination of static SIMS, ''static'' AES (i.e. direct counting of the N (E) spectrum at low primary electron current), and XPS. The proportionally of the O(1s) and O(KLL) signals allows one to establish a coverage scale in the submonolayer range. For Mo and Ti, saturation of the Auger and O(1s) signals is reached after 4 and 9 L, respectively. The beginning surface oxidation is indicated by the successive appearance of the compound secondary ions MeO/sup + -//sub n/ at about 2-20 L. For Ti, the in-depth growth of the ''oxide'' is indicated at exposures above 8 L by the chemical shift of the Ti 2p levels, whereas for Mo no shift of the Mo(3d) levels is present up to 1000 L. Co behaves similarly to Ti, except for the higher oxygen doses needed for saturation and an additional phase at 0-5 L, which is characterized by enhanced Co/sup +/, CoO/sup +/, and O/sup -/ emission, a break in the O(1s)vs exposure curve, and an initial O(1s) level with different binding energy.

Research Organization:
Physikalisches Institut der Universitaet, Schlossplatz 7, 4400 Muenster, West Germany
OSTI ID:
6807186
Journal Information:
J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 15:2; ISSN JVSTA
Country of Publication:
United States
Language:
English