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Low-temperature deposition of ZrC thin films from a single source precursor

Conference ·
OSTI ID:6798352
; ;  [1];  [2]
  1. Los Alamos National Lab., NM (United States)
  2. Massachusetts Inst. of Tech., Cambridge, MA (United States). Dept. of Nuclear Engineering
Stable zirconium carbide thin films have been deposited from a single source organometallic precursor, tetraneopentyl zirconium, at substrate temperatures above 500C. Materials deposited above this temperature are crystalline by X-ray diffraction. A metal to carbon ratio of 1:2 is observed by Auger electron spectroscopy depth profiling. X-ray photoelectron spectroscopy indicates the zirconium is single phase. The observed spectra correspond well to spectra for zirconium carbide standards. Carbon XPS reveals carbidic and graphitic or hydrocarbon species with a third unknown carbon species. Elastic recoil detection finds a large, up to 16%, hydrogen content in the thin film.
Research Organization:
Los Alamos National Lab., NM (United States)
Sponsoring Organization:
DOE; USDOE, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
6798352
Report Number(s):
LA-UR-93-351; CONF-921101--83; ON: DE93007333
Country of Publication:
United States
Language:
English