High resolution and high voltage electron microscopy at the University of California, Berkeley

Conference · Sat Dec 31 23:00:00 EST 1977

OSTI ID:6797623

Thomas, G; Westmacott, K H

Recent applications of high-resolution and high-voltage techniques at Berkely are described, using 100-kV TEMs and a standard 650-keV HVEM: grain boundary precipitation in Al--Zn, lattice imaging of grain boundaries in ceramics, steels, phase transitions and magnetic properties of ferrites, lattice defects, precipitation in Al--Si and behavior of interstitial dislocations under electron irradiation, effect of oxide films on loop formation in Al--Mg, and polytypism in magnesium Sialon. 13 refs. 12 figs. (DLC)

• Research Organization: California Univ., Berkeley (USA). Lawrence Berkeley Lab.
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6797623
• Report Number(s): LBL-6998; CONF-771165-1
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
360202 -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
ALLOYS
BEAMS
CERAMICS
CRYSTAL DEFECTS
CRYSTAL LATTICES
CRYSTAL STRUCTURE
DISLOCATIONS
ELECTRON BEAMS
ELECTRON MICROSCOPY
LEPTON BEAMS
LINE DEFECTS
MICROSCOPY
MICROSTRUCTURE
PARTICLE BEAMS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
RESEARCH PROGRAMS