Microwave surface resistance of magnetron-sputtered Tl-Ba-Ca-Cu-O films on silver substrates

Journal Article · Mon May 21 04:00:00 EDT 1990 · Applied Physics Letters; (USA)

DOI:https://doi.org/10.1063/1.102954· OSTI ID:6786039

Cooke, D W; Gray, E R; Arendt, P N; Reeves, G A; Houlton, R J; Elliott, N E; Brown, D R ^[1]

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1. Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (USA)

Surface resistance measurements on Tl-Ba-Ca-Cu-O thick films ({similar to}15 {mu}m) magnetron sputtered onto BaF{sub 2}-buffered, silver-based (Consil 995) substrates have been made at a microwave frequency of 22 GHz. The relatively large-area films ({similar to}5 cm{sup 2}) are characterized by surface resistance values of 6.9{plus minus}2 m{Omega} at 11.3 K and 30.2{plus minus}1 m{Omega} at 77 K; the corresponding values for Cu are 10 and 22 m{Omega}, respectively. These results demonstrate that Tl-Ba-Ca-Cu-O can be deposited onto {ital large}-{ital area}, {ital metallic} substrates with characteristic surface resistance values lower than Cu at 4 K. Orientation of the film should improve the surface resistance at 77 K, thereby making the fabrication of microwave cavities that are superior to Cu possible.

• OSTI ID: 6786039
• Journal Information: Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:21; ISSN APPLA; ISSN 0003-6951
• Country of Publication: United States
• Language: English

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