Plasma-dust interactions of mutually shielded particles in low pressure glow discharges
- Univ. of Illinois, Urbana, IL (United States)
{open_quotes}Dust{close_quotes} contamination is a major concern in the plasma processing of microelectronics components. Particles (10s nm to many microns) negatively charge in glow discharges and are therefore subject to both electrical and fluid forces. These forces cause particles to accumulate in regions where the interparticle spacing may be less than the plasma shielding distance of the particles. The authors have developed a Pseudoparticle in Cell-Monte Carlo simulation for electron and ion transport in the vicinity of dust particles to investigate conditions where the sheaths of adjacent particles overlap. Results from the model will be discussed. They found that when two dust particles are aligned parallel to the electric field, the upstream particle (with respect to the electron drift) shadows the rear particle, resulting in a lower total charge on the rear particle. They also observe that the total charge on two dust particles decreases as the interparticle distance decreases and their mutual shielding increases.
- OSTI ID:
- 67840
- Report Number(s):
- CONF-9310400--
- Journal Information:
- Bulletin of the American Physical Society, Journal Name: Bulletin of the American Physical Society Journal Issue: 13 Vol. 38; ISSN BAPSA6; ISSN 0003-0503
- Country of Publication:
- United States
- Language:
- English
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