Growth of highly oriented carbon nanotubes by plasma-enhanced hot filament chemical vapor deposition

Journal Article · Tue Dec 01 04:00:00 EST 1998 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.122912· OSTI ID:677216

Huang, Z P; Xu, J W; Ren, Z F; Wang, J H ^[1]; Siegal, M P; Provencio, P N ^[2]

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1. Materials Synthesis Laboratory, Departments of Physics and Chemistry, and Center for Advanced Photonic and Electronic Materials (CAPEM), State University of New York at Buffalo, Buffalo, New York 14260 (United States)
2. Sandia National Laboratories, Albuquerque, New Mexico 87185-1421 (United States)

Highly oriented, multiwalled carbon nanotubes were grown on polished polycrystalline and single crystal nickel substrates by plasma enhanced hot filament chemical vapor deposition at temperatures below 666 {degree}C. The carbon nanotubes range from 10 to 500 nm in diameter and 0.1 to 50 {mu}m in length depending on growth conditions. Acetylene is used as the carbon source for the growth of the carbon nanotubes and ammonia is used for dilution gas and catalysis. The plasma intensity, acetylene to ammonia gas ratio, and their flow rates, etc. affect the diameters and uniformity of the carbon nanotubes. {copyright} {ital 1998 American Institute of Physics.}

• OSTI ID: 677216
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 26 Vol. 73; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ACETYLENE
AMMONIA
CARBON
CATALYSIS
CHEMICAL VAPOR DEPOSITION
PLASMA
SCANNING ELECTRON MICROSCOPY
TRANSMISSION ELECTRON MICROSCOPY
TUBULES