Ion-assisting magnetron sources: Principles and uses

Journal Article · Tue May 01 00:00:00 EDT 1990 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

DOI:https://doi.org/10.1116/1.576911· OSTI ID:6769380

Window, B; Harding, G L ^[1]

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1. CSIRO Division of Applied Physics, Sydney, NSW 2070, Australia (AU)

The design and performance of magnetron sources which provide at the substrate not only the flux of sputtered atoms but also fluxes of electrons and ions from the plasma are described. This energetic particle bombardment (which is directed to the substrate by an unbalanced magnetic field design) can be beneficial, as when it is used to ion assist the growth of the depositing thin film, or deleterious, e.g., by providing extra heating. Applications of unbalanced magnetrons to investigate the technology of magnetron sputtering are described. Ion assistance of the growing film increases the biaxial compressive stress in the growing film due to an atomic peening process. The lattice strain produced by the stress can be measured using x-ray diffraction, and can be used to quantify the degree of ion assistance. Effects studied in films of refractory metals include the increase in stress until plastic flow occurs during growth, changes in preferential orientation, the effectiveness of the different gases Ar and Xe in producing stress, energetic neutral bombardment, and moderation of sputtered atoms. New results are presented here for the temperature dependence of the stress production in molybdenum films. The application of unbalanced magnetrons to industrial deposition processes is discussed.

• OSTI ID: 6769380
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Vol. 8:3; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
36 MATERIALS SCIENCE
MAGNETRONS
PERFORMANCE
MOLYBDENUM
SPUTTERING
STRESS ANALYSIS
DESIGN
EXPERIMENTAL DATA
FILM FLOW
ION SOURCES
TEMPERATURE DEPENDENCE
DATA
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FLUID FLOW
INFORMATION
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NUMERICAL DATA
TRANSITION ELEMENTS
640301* - Atomic
Molecular & Chemical Physics- Beams & their Reactions
360103 - Metals & Alloys- Mechanical Properties