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A comparative fully relativistic/nonrelativistic first-principles X[alpha]-DVM and photoelectron spectroscopic investigation of electronic structure in homologous 4f and 5f tris([eta][sup 5]-cyclopentadienyl)metal(IV) alkoxide complexes

Journal Article · · Inorganic Chemistry; (United States)
DOI:https://doi.org/10.1021/ic00070a018· OSTI ID:6767844
; ;  [1];  [2]; ;  [3]
  1. Universita di Catania (Italy)
  2. Universita di Padova (Italy)
  3. Northwestern Univ., Evanston, IL (United States)
The electronic structure of ([eta][sup 5]-C[sub 5]H[sub 5])[sub 3]MOR (M = Ce, Th, U) complexes has been investigated by He I and He II UV photoelectron spectroscopy combined with SCF X[alpha]-DVM calculations. Fully relativistic Dirac-Slater calculations were also carried out for the M = Th complex. The nonrelativistic calculations indicate that metal-ligand interactions involving the highest energy ligand orbitals involve primarily metal 5f orbitals while 6d admixtures are found for lower energy orbitals. The M-O bonding is both [sigma] and [pi] in nature and involves primarily metal 6d atomic orbitals. Evidence of a charge redistribution mechanism along the CH[sub 3][yields]O[yields]M[yields]Cp[sub 3] direction provides a satisfactory explanation for the shortened M-O distances and strong propensity for nearly linear M-O-CH[sub 3] linkages observed in diffraction studies. The fully relativistic calculations show that metal d contributions are slightly underestimated at the nonrelativistic level. Such deviations do not, however, alter the overall description of the metal-ligand bonding. The nonrelativistic configuration of the metal center compares well with the relativistic data. Gas-phase ionization energies can be accurately and comparably evaluated at the computationally more efficient nonrelativistic level if optimized basis sets and potential representations are used.
OSTI ID:
6767844
Journal Information:
Inorganic Chemistry; (United States), Journal Name: Inorganic Chemistry; (United States) Vol. 32:18; ISSN 0020-1669; ISSN INOCAJ
Country of Publication:
United States
Language:
English