The preparation and characterization of optical thin films produced by ion-assisted deposition
Inert and reactive gas ion beams have been used in the preparation of high-quality optical thin films for use as dielectric coatings on optical components, solar selective absorbers, and protective films on Ag and Al mirrors. Films are deposited by electron-beam evaporation and simultaneous irradiation of the growing film at the substrate or by ion-beam sputtering with and without ion assistance. Substantial improvement in the film packing density has been achieved, the refractive indices increased, and water penetration through the films was suppressed. Tin has been deposited by Ti evaporation and nitrogen irradiation for use as an element in a high-temperature solar selective absorber. Amorphous hydrogenated silicon (a-Si:H) has also been produced by Si evaporation and hydrogen irradiation or by mixed ion-beam sputtering. Significant changes in the crystal structure of PbS have also been achieved by ion irradiation. Dielectric films of ZrO/sub 2/, SiO/sub 2/, and Al/sub 2/O/sub 3/ have been deposited by ion-assisted deposition and ZrO/sub 2/ has been used as a highly successful protective coating on Al and Ag mirrors. The optical properties of the films have been studied and the film composition checked by x-ray diffraction, nuclear reaction analysis (NRA), Rutherford backscattering (RBS), x-ray photoelectron spectroscopy (XPS), and ion scattering spectroscopy (ISS).
- Research Organization:
- CSIRO Division of Applied Physics, Sydney, Australia 2070
- OSTI ID:
- 6761896
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Vol. 2:2
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
GENERAL PHYSICS
36 MATERIALS SCIENCE
ALUMINIUM
ANTIREFLECTION COATINGS
PROTECTIVE COATINGS
ALUMINIUM OXIDES
ELECTRON COLLISIONS
ION COLLISIONS
OPTICAL PROPERTIES
SPUTTERING
VACUUM EVAPORATION
ARGON IONS
COLLISIONS
COPPER
HYDROGEN IONS 1 PLUS
KRYPTON IONS
LEAD SULFIDES
PHYSICAL RADIATION EFFECTS
SILICA
SILICON
HYDROGENATION
SILVER
THIN FILMS
FABRICATION
TITANIUM NITRIDES
ZIRCONIUM OXIDES
REFRACTIVITY
AMORPHOUS STATE
CORROSION RESISTANCE
CRYSTAL STRUCTURE
DIELECTRIC MATERIALS
ELECTRON BEAMS
ENERGY BEAM DEPOSITION
ION BEAMS
MIRRORS
PHOTOELECTRON SPECTROSCOPY
SCATTERING
SOLAR ABSORBERS
SPECTRALLY SELECTIVE SURFACES
SURFACE COATING
SYNTHESIS
THICKNESS
VACUUM COATING
VAPOR DEPOSITED COATINGS
X RADIATION
X-RAY DIFFRACTION
ALUMINIUM COMPOUNDS
BEAMS
CATIONS
CHALCOGENIDES
CHARGED PARTICLES
CHEMICAL REACTIONS
COATINGS
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
DIMENSIONS
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELEMENTS
EQUIPMENT
EVAPORATION
FILMS
HYDROGEN IONS
IONIZING RADIATIONS
IONS
LEAD COMPOUNDS
LEPTON BEAMS
MATERIALS
METALS
MINERALS
NITRIDES
NITROGEN COMPOUNDS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PARTICLE BEAMS
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
PNICTIDES
RADIATION EFFECTS
RADIATIONS
SEMIMETALS
SILICON COMPOUNDS
SILICON OXIDES
SOLAR EQUIPMENT
SPECTROSCOPY
SULFIDES
SULFUR COMPOUNDS
SURFACES
TITANIUM COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
ZIRCONIUM COMPOUNDS
640301* - Atomic
Molecular & Chemical Physics- Beams & their Reactions
360605 - Materials- Radiation Effects