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Radiation damage in neutron transmutation doped silicon: Electrical property studies

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.325548· OSTI ID:6761177

Radiation damage in neutron-transmutation-doped (NTD) silicon, irradiated to introduce 5 x 10/sup 13/ to 6 x 10/sup 16/ phosphorus cm/sup -3/, has been studied by electrical property measurements. The experimental results indicate that thermal-neutron-induced (n,..gamma..) recoil-type damage can be annealed at 400 /sup 0/C. The nature of any remaining lattice defects and their annealing behavior above 400 /sup 0/C is a function of the fast-neutron fluence. Small defect clusters are present in Si irradiated with a light-to-moderate fast-neutron fluence (< or =5 x 10/sup 18/ n cm/sup -2/), and temperature-dependent Hall coefficient measurements indicate that at least two deep acceptor levels and one deep donor level are formed during annealing. One of these acceptor levels anneals at approx.450 /sup 0/C, and the other two levels anneal at approx.550 /sup 0/C. A shallow acceptor level near the valence band that anneals at 750 /sup 0/C is also observed. Larger defect clusters which reduce the electron mobility tremendously and distort the band structure are formed in heavily irradiated Si (5 x 10/sup 18/ to 10/sup 20/ n cm/sup -2/). Virtually all of the electrically detectable radiation damage in NTD Si irradiated with a fast-neutron fluence up to 10/sup 20/ n cm/sup -2/ can be removed by annealing at 750 /sup 0/C for 1/2 h. There is some indication that a minority-carrier-recombination effect remains even after such annealing.

Research Organization:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
OSTI ID:
6761177
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 49:9; ISSN JAPIA
Country of Publication:
United States
Language:
English