Bulk and surface characterization of a dewetting thin film polymer bilayer
- Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202 (United States)
- Advanced Light Source, Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
- Advanced Development and Research, Hilord Chemical Corporation, Hauppauge, New York 11788 (United States)
- Department Materials Science and Engineering, SUNY at Stony Brook, Stony Brook, New York 11794 (United States)
- IBM Research Division, Almaden Research Center, San Jose, California 95120 (United States)
We have monitored the progression of the dewetting of a partially brominated polystyrene (PBrS) thin film on top of a polystyrene (PS) thin film with scanning transmission x-ray microscopy (STXM) as well as photoemission electron microscopy (PEEM). We mapped the projected thickness of each constituent polymer species and the total thickness of the film with STXM, while we determined the surface composition with PEEM. Our data show that the PBrS top layer becomes encapsulated during the later stages of dewetting and that atomic force microscopy topographs cannot be utilized to determine the contact angle between PBrS and PS. {copyright} {ital 1998 American Institute of Physics.}
- OSTI ID:
- 675105
- Journal Information:
- Applied Physics Letters, Vol. 73, Issue 25; Other Information: PBD: Dec 1998
- Country of Publication:
- United States
- Language:
- English
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