Interfacial electronic charge transfer and density of states in short period Cu/Cr multilayers
Conference
·
OSTI ID:675088
Nanometer period metallic multilayers are ideal structures to investigate electronic phenomena at interfaces between metal films since interfacial atoms comprise a large atomic fraction of the samples. The multilayers studied were fabricated by magnetron sputtering and consist of bilayers from 1.9 mn to 3.3 mn. X-ray diffraction, cross-section TEM and plan-view TEM show the Cu layers to have a BCC structure Cu in contrast to its equilibrium FCC structure. The electronic structure of the Cu and the Cr layers in several samples of thin Cu/Cr multilayers were studied using x-ray absorption spectroscopy (XAS). Total electron yield was measured and used to study the white lines at the Cu L{sub 2} and L{sub 3} absorption edges. The white lines at the Cu absorption edges are strongly related to the unoccupied d-orbitals and are used to calculate the amount of charge transfer between the Cr and Cu atoms in interfaces. Analysis of the Cu white lines show a charge transfer of 0.026 electrons/interfacial Cu atom to the interfacial Cr atoms. In the Cu XAS spectra we also observe a van Hove singularity between the L{sub 2} and L{sub 3} absorption edges as expected from the structural analysis. The absorption spectra are compared to partial density of states obtained from a full-potential linear muffin-tin orbital calculation. The calculations confirm the presence of charge transfer and indicate that it is localized to the first two interfacial layers in both Cu and Cr.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE Office of Financial Management and Controller, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 675088
- Report Number(s):
- UCRL-JC--130780; CONF-980405--; ON: DE98057688; BR: YN0100000
- Country of Publication:
- United States
- Language:
- English
Similar Records
Interfacial electronic charge transfer and density of states in short period Cu/Cr multilayers
Electronic effects at interfaces in Cu-Cr, Mo, W, Ta, Re multilayers
Electronic effects at interfaces in Cu - Cr, Mo, Ta, Re Multilayers
Technical Report
·
Thu Jul 01 00:00:00 EDT 1999
·
OSTI ID:13883
Electronic effects at interfaces in Cu-Cr, Mo, W, Ta, Re multilayers
Conference
·
Tue Mar 31 23:00:00 EST 1998
·
OSTI ID:665627
Electronic effects at interfaces in Cu - Cr, Mo, Ta, Re Multilayers
Technical Report
·
Mon Jun 28 00:00:00 EDT 1999
·
OSTI ID:13882