Secondary-ion emission from vanadium as a function of incident ion mass and energy in the range 25--275 keV
Measurements of the intensities of low-energy secondary ions emitted from clean and oxidized polycrystalline vanadium surfaces under (25--275)-keV He/sup +/, Ne/sup +/, Ar/sup +/, and Kr/sup +/ bombardment are reported. Whereas the intensities of the metallic-ion species are observed to be proportional to the sputtering yield of vanadium and, therefore, dependent on elastic energy deposition, the intensities of O/sup +/ ions are not. Rather, they increase linearly with increasing projectile velocity in a manner similar to the electronic stopping power or, equivalently, to the yield of secondary electrons. While the production of metallic ions may be described adequately by a number of the proposed models of secondary-ion emission, that of O/sup +/ cannot. The possibility that O/sup +/ is produced by a mechanism similar to electron-stimulated desorption is discussed.
- Research Organization:
- A.W. Wright Nuclear Structure Laboratory, Yale University, New Haven, Connecticut 06511
- OSTI ID:
- 6749285
- Journal Information:
- Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 35:4; ISSN PRBMD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ARGON IONS
CHARGED PARTICLES
CHEMICAL REACTIONS
COLLISIONS
CRYSTALS
DATA
ELEMENTS
EMISSION
ENERGY DEPENDENCE
ENERGY RANGE
EXPERIMENTAL DATA
HELIUM IONS
INFORMATION
ION COLLISIONS
IONS
KEV RANGE
KEV RANGE 10-100
KEV RANGE 100-1000
KRYPTON IONS
MASS
METALS
NEON IONS
NUMERICAL DATA
OXIDATION
OXYGEN IONS
POLYCRYSTALS
SECONDARY EMISSION
SPUTTERING
SURFACES
TRANSITION ELEMENTS
ULTRAHIGH VACUUM
VANADIUM