In situ growth of epitaxial YAlO[sub 3] thin films by metal-organic chemical vapor deposition

Journal Article · Fri Jan 01 00:00:00 EST 1993 · Chemistry of Materials; (United States)

DOI:https://doi.org/10.1021/cm00025a006· OSTI ID:6729657

Han, B; Neumayer, D A; Schulz, D L; Hinds, B J; Marks, T J ^[1]

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1. Northwestern Univ., Evanston, IL (United States)

The successful integration of high-temperature superconducting (HTS) materials into active and passive microelectronics technologies depends crucially upon advances in the fundamental science of thin film formation and performance. To this end, considerable progress has recently been made in the growth of HTS films by both physical vapor deposition (PVD) and metal-organic chemical vapor deposition (MOCVD) techniques. Equally important for multilayer device fabrication is the quest for lattice-matched, chemically compatible, low dielectric constant/low dielectric loss materials for use as substrates, buffers, dielectrics, insulators, and overlayers. As in HTS film formation, MOCVD offers the attraction for insulating ceramic film growth of the ability to coat complex shapes, simplified apparatus, adaptability to large scale-area depositions, and depositions at low temperatures. YAlO[sub 3] is an example of a promising insulating material for HTS device applications, having a good lattice and thermal expansion match with YBCO, BSCCO, and TBCCO as well as excellent dielectric properties [epsilon] [approx] 16 at 77 K, 10 GHz; tan [delta] = 1 [times] 10[sup [minus]5] at 77 K, 10 GHz. Furthermore, YA1O exhibits no phase transitions between 25 and 1300[degrees]C, which in other materials results in twinning and degradation of film properties. The authors report here the first in situ (not requiring a postanneal) deposition of phase-pure epitaxial thin films of YA1O by MOCVD. 12 refs., 4 figs.

• OSTI ID: 6729657
• Journal Information: Chemistry of Materials; (United States), Vol. 5:1; ISSN 0897-4756
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM OXIDES
CHEMICAL VAPOR DEPOSITION
YTTRIUM OXIDES
ELECTRICAL INSULATORS
MILLER INDICES
SCANNING ELECTRON MICROSCOPY
THIN FILMS
X-RAY DIFFRACTION
ALUMINIUM COMPOUNDS
CHALCOGENIDES
CHEMICAL COATING
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
ELECTRICAL EQUIPMENT
ELECTRON MICROSCOPY
EQUIPMENT
FILMS
MICROSCOPY
OXIDES
OXYGEN COMPOUNDS
SCATTERING
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
YTTRIUM COMPOUNDS
360202* - Ceramics
Cermets
& Refractories- Structure & Phase Studies