Magnetic anisotropy in SmCo amorphous films
Magnetic anisotropy in sputter-deposited Sm/sub x/Co/sub 100-//sub x/ amorphous films depended on the substrate temperature even for a narrow composition range of 18less than or equal toxless than or equal to26. Deposition between 90 and 140 /sup 0/C brought a negative perpendicular anisotropy. All the films were magnetically isotropic in the film plane with zero torque curve for a field rotated in the film plane, suggesting that the negative perpendicular anisotropy did not come from easy axes of uniaxial anisotropy due to some structures being in the film plane. A large negative anisotropy vanished after annealing. On the other hand, a positive anisotropy which overcomes the demagnetizing energy was induced by a deposition at 60--90 /sup 0/C. Films with a positive perpendicular anisotropy had a relatively large electric resistivity and hence a large Hall resistivity. The magnetostriction measurement showed that a stress (film/substrate)-induced anisotropy did not play an important role in both positive and negative perpendicular anisotropies. A possible origin of the large negative anisotropy is internal stress and that of the positive anisotropy is some microstructure which appears at a substrate temperature of 60--90 /sup 0/C, at which temperature the internal stress may be reduced.
- Research Organization:
- Department of Control Engineering, Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560, Japan
- OSTI ID:
- 6728909
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 64:10; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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