Ringfield lithographic camera

Patent · Tue Sep 08 00:00:00 EDT 1998

OSTI ID:672700

Sweatt, W C

A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D{sub source} {approx_equal} 0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors. 11 figs.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: Sandia Corp., Albuquerque, NM (United States)
• Patent Number(s): US 5,805,365/A/
• Application Number: PAN: 8-542,411
• OSTI ID: 672700
• Resource Relation: Other Information: PBD: 8 Sep 1998
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES
MASKING
MICROELECTRONIC CIRCUITS
CAMERAS
EXTREME ULTRAVIOLET RADIATION
DESIGN
MIRRORS