Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Modeling of hydrogen implantation into graphite

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.341234· OSTI ID:6724535
A new theoretical framework has been developed which is applicable to the implantation and ion-induced release of hydrogen isotopes in graphite. It provides a physical basis and a refinement of the predictions of the simple model of local saturation and mixing. The model treats the trapping at defects and a local release of trapped atoms by nuclear knock-on. Ion deposition and damage functions are taken from t-smcapsr-smcapsIm-smcaps simulations. The detrapped atoms may become retrapped or recombine to molecules, which then are transported to the surface by fast molecular diffusion, and subsequently released. By the choice of suitable rate constants in the model calculations, different experimental findings for the implantation and high-fluence self-reemission of deuterons in graphite may be explained consistently. Examples cover the saturation as a function of temperature and energy, depth profiles, gas reemission, thermal desorption, and effects of predamage.
Research Organization:
Max Planck Institute fuer Plasmaphysik, EURATOM Association, D-8046 Garching/Muenchen, Federal Republic of Germany
OSTI ID:
6724535
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 64:10; ISSN JAPIA
Country of Publication:
United States
Language:
English