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Properties of aluminum overlayers on chemically modified TiO[sub 2](110) surfaces

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.579424· OSTI ID:6702389
;  [1]
  1. Laboratory for Surface Science and Technology, University of Maine, Orono, Maine 04469-5764 (United States)

The chemical interactions of ultra-thin aluminum films with clean and chemically modified stoichiometric TiO[sub 2] (110) surfaces have been studied by several electron spectroscopies (ultraviolet photoelectron, x-ray photoelectron, and Auger electron) and low-energy electron diffraction. The chemical properties of the Al overlayers on clean TiO[sub 2] surfaces were compared to those on surfaces pre-dosed with submonolayer amounts of carbon or potassium. The thermal stability of each system was also examined. On the clean surface, the first monolayer of aluminum completely wets the surface and becomes oxidized, while the Ti 4[sup +] cations in the near surface region are reduced. Submonolayer amounts of potassium interact with the stoichiometric TiO[sub 2] surface in a similar manner and form a potassium oxide overlayer. Aluminum deposited onto a potassium-dosed TiO[sub 2] (110) surface competes with K for oxygen and reduces more Ti 4[sup +] cations in the interface region. Carbon species adsorbed on the TiO[sub 2] (110) surface by electron beam decomposition of ethylene prior to the aluminum deposition interact only weakly with the oxide surface, but retard the oxidation rate of aluminum and decrease the temperature stability of the aluminum oxide overlayer.

OSTI ID:
6702389
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 13:1; ISSN 0734-2101; ISSN JVTAD6
Country of Publication:
United States
Language:
English