High-accuracy interferometry of extreme ultraviolet lithographic optical systems

Journal Article · Sat Oct 31 23:00:00 EST 1998 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.590498· OSTI ID:670205

Goldberg, K A; Naulleau, P ^[1]; Lee, S ^[2]; Bresloff, C ^[1]; Henderson, C ^[3]; Attwood, D; Bokor, J ^[4]

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1. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
2. Center for X-Ray Optics, Lawrence Berkeley National Laboratory and EECS Department, University of California, Berkeley, California 94720 (United States)
3. Sandia National Laboratories, Livermore, California (United States)
4. Center for X-Ray Optics, Lawrence Berkeley National Laboratory

Recent improvements in extreme ultraviolet (EUV) lithographic imaging with Schwarzschild objectives have come as a direct result of at-wavelength interferometric characterization with the phase-shifting point diffraction interferometer. High accuracy system wave front characterization has led to the determination of the best Schwarzschild objective and subaperture configuration. These investigations and the results of imaging experiments are discussed. Two pinhole null tests have provided an {ital in situ} method of demonstrating reference wavefront accuracy of {approximately}{lambda}{sub EUV}/300.

• OSTI ID: 670205
• Report Number(s): CONF-9805132--
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 6 Vol. 16; ISSN 0734-211X; ISSN JVTBD9
• Country of Publication: United States
• Language: English

Related Subjects

44 INSTRUMENTATION
INCLUDING NUCLEAR AND PARTICLE DETECTORS
APERTURES
DIFFRACTION
EXTREME ULTRAVIOLET RADIATION
IMAGES
INTERFEROMETRY
LENSES
OPTICAL SYSTEMS
PHASE SHIFT