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XeF ground-state dynamics in a laser discharge

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.90220· OSTI ID:6692429
The time evolution of gain and absorption in an XeF laser discharge is studied using a pulsed uv dye-laser probe and timing system with +- 7-nsec resolution. The dissociation rate of the lowest vibrational level of the XeF ground state as a function of helium buffer pressure is found to have a slope of 1 x 10/sup 4/ sec/sup -1/ Torr/sup -1/ ( +- 15%).
Research Organization:
Department of Physics and Spectroscopy Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
OSTI ID:
6692429
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 33:11; ISSN APPLA
Country of Publication:
United States
Language:
English