Intense electron-beam pinch formation and propagation in rod pinch diodes
Journal Article
·
· Appl. Phys. Lett.; (United States)
Intense electron-beam pinches are formed and propagated at relatively high impedance (5--25 ..cap omega..) using rod pinch diodes. Pinch propagation of up to 20 cm with 45% efficiency and ion-generation efficiency > or approx. =15% has been observed.
- Research Organization:
- Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375
- OSTI ID:
- 6661512
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 33:9; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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