Physical and tribological characteristics of ion-implanted diamond films

Technical Report · Tue Nov 01 04:00:00 EST 1994

OSTI ID:6654153

Miyoshi, K; Heidger, S; Korenyi-both, A L; Jayne, D T; Herrera-Fierro, P; Shogrin, B; Wilbur, P J; Wu, R L.C.; Garscadden, A; Barnes, P N

Unidirectional sliding friction experiments were conducted with a natural, polished diamond pin in contact with both as-deposited and carbon-ion-implanted diamond films in ultrahigh vacuum. Diamond films were deposited on silicon, silicon carbide, and silicon nitride by microwave-plasma-assisted chemical vapor deposition. The as-deposited diamond films were impacted with carbon ions at an accelerating energy of 60 keV and a current density of 50 micron A/cm(exp 2) for approximately 6 min, resulting in a dose of 1.2 x 10(exp 17) carbon ions/cm(exp 2). The results indicate that the carbon ion implantation produced a thin surface layer of amorphous, nondiamond carbon. The nondiamond carbon greatly decreased both friction and wear of the diamond films. The coefficients of friction for the carbon-ion-implanted, fine-grain diamond films were less than 0.1, factors of 20 to 30 lower than those for the as-deposited, fine-grain diamond films. The coefficients of friction for the carbon-ion-implanted, coarse-grain diamond films were approximately 0.35, a factor of five lower than those for the as-deposited, coarse-grain diamond films. The wear rates for the carbon-ion-implanted, diamond films were on the order of 10(exp -6) mm(exp 3)/Nm, factors of 30 to 80 lower than that for the as-deposited diamond films, regardless of grain size. The friction of the carbon-ion-implanted diamond films was greatly reduced because the amorphous, nondiamond carbon, which had a low shear strength, was restricted to the surface layers (less than 0.1 micron thick) and because the underlying diamond materials retained their high hardness. In conclusion, the carbon-ion-implanted, fine-grain diamond films can be used effectively as wear resistant, self-lubricating coatings for ceramics, such as silicon nitride and silicon carbide, in ultrahigh vacuum.

• Research Organization: National Aeronautics and Space Administration, Cleveland, OH (United States). Lewis Research Center
• OSTI ID: 6654153
• Report Number(s): N-95-14303; NASA-TM--106682; E--9146; NAS--1.15:106682; CNN: NAS3-25685; RTOP 505-63-5A; RTOP 505-62-00
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360203 -- Ceramics
Cermets
& Refractories-- Mechanical Properties
360603* -- Materials-- Properties
CARBIDES
CARBON
CARBON COMPOUNDS
DEPOSITION
DIAMONDS
ELEMENTAL MINERALS
ELEMENTS
FILMS
FRICTION
GRAPHITE
ION IMPLANTATION
MINERALS
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
PNICTIDES
SILICON CARBIDES
SILICON COMPOUNDS
SILICON NITRIDES
SLIDING FRICTION
SURFACE COATING
TRIBOLOGY
ULTRAHIGH VACUUM