Threshold of a thallium-iodide photodissociation laser operated at low pressure

Journal Article · Wed Dec 01 04:00:00 EST 1982 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.330493· OSTI ID:6644236

Henchoz, P; Luethy, W; Schmiele, R

The emission intensity of the 535-nm line of a thallium-iodide photodissociation laser excited with 193-nm ultraviolet radiation is measured as a function of pump energy and vapor pressure. Pressure was varied between 4 x 10/sup -5/ and 0.13 Torr. No threshold for positive gain has been found experimentally. The measurements and computer simulation indicate a possibility of constructing lasers with extremely low excitation energy.

• Research Organization: Institute of Applied Physics, University of Bern, Sidlerstrasse 5, CH-3012 Bern, Switzerland
• OSTI ID: 6644236
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 53:12; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
AMPLIFICATION
COMPUTERIZED SIMULATION
DATA
DISSOCIATION
ELECTROMAGNETIC RADIATION
EMISSION SPECTRA
ENERGY DEPENDENCE
ENERGY-LEVEL TRANSITIONS
EXCITATION
EXPERIMENTAL DATA
GAIN
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
HIGH VACUUM
INFORMATION
IODIDES
IODINE COMPOUNDS
LASERS
MATHEMATICAL MODELS
MEDIUM VACUUM
NUMERICAL DATA
PHYSICAL PROPERTIES
PRESSURE DEPENDENCE
RADIATION EFFECTS
RADIATIONS
SIMULATION
SPECTRA
THALLIUM COMPOUNDS
THALLIUM IODIDES
THERMODYNAMIC PROPERTIES
ULTRAVIOLET RADIATION
VAPOR PRESSURE
WAVELENGTHS