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Weak ferromagnetism induced by the external field above [ital T][sub [ital N]] in Gd[sub [ital z]]CuO[sub 4]

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.353599· OSTI ID:6631986
; ;  [1]; ; ;  [2]; ;  [3];  [4];  [5]
  1. Comision Nacional de Energia Atomica, Centro Atomico Bariloche, 8400 San Carlos de Bariloche (Argentina)
  2. Institut de Ciencia de Materials de Barcelona, Campus UAB, 08193 Bellaterra (Spain)
  3. Universidad de Santiago Comision Nacional de Energia Atomica, Centro Atomico Bariloche, 8400 San Carlos de Bariloche (Argentina)
  4. San Diego State University, San Diego, California 92182-0325 (United States)
  5. Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)
A detailed study of the temperature and field dependence of the dc magnetization near the antiferromagnetic (AF) transition in Gd[sub 2]CuO[sub 4] shows the presence of field-induced weak ferromagnetism (WF) well above the Neel temperature [ital T][sub [ital N]]. ac susceptibility measurements indicate [ital T][sub [ital N]]=266(3) and 282(3) K, for single crystals and ceramic samples, respectively. The shift of the electron-spin-resonance line of the Gd[sup 3+] ions as a function of temperature [ital T], [delta][ital H][sub [ital r]]([ital T]), is compared with the static internal field [ital H][sub [ital i]]([ital T]), which describes the coupling between the paramagnetic Gd lattice and the WF component of the Cu moments. Both [delta][ital H][sub [ital r]]([ital T]) and [ital H][sub [ital i]]([ital T]) show that the WF persists up to [approx]50 K above [ital T][sub [ital N]]. The initial susceptibility (for [ital H][le]100 G) presents a contribution in excess of the paramagnetism of Gd ions. For [ital T][ge][ital T][sub [ital N]], it decays as [ital K]([ital T][minus][ital T][sub [ital N]])[sup [minus]1], with [ital K]=0.20(3) emu K mol. The relationship between this result and the strong two-dimensional AF correlations in these cuprates is discussed.
OSTI ID:
6631986
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 73:10; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English