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Evidence of chemical passivity in amorphous Ni-20P alloy

Journal Article · · J. Electrochem. Soc.; (United States)
DOI:https://doi.org/10.1149/1.2100392· OSTI ID:6607265
The authors observed that amorphous Ni-20P (atom percent) exhibits chemical passivity in 0.2N HCl. No distinct mechanical barrier to diffusion, such as an oxide film, is present. One characteristic of this chemical passivation process is that the absence of a barrier film would be expected to exclude the possibility of pitting, which occurs due to localized breakdown of passive films. The electrochemical studies revealed breakdown of the passive state (transpassivity) at approximately 0.2V, but with no accompanying pitting. Ni-20P amorphous alloy polarized in 0.2N HCl passivates at potentials between about -0.3 and 0.2V (SCE), beyond which transpassive dissolution occurs. In contrast, pure Ni does not show stable passivity and pits at potentials above the E/sub oc/ of -0.55V (SCE). The passive behavior if Ni-20P was verified in potentio-static experiments, which showed continuous decay of current for times beyond 10/sup 4/s and to current densities below 10/sup -6/ A/cm/sup 2/; at transpassive potentials, it dissolved at a nearly constant current density.
Research Organization:
Sandia National Labs., Albuquerque, NM
OSTI ID:
6607265
Journal Information:
J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 134:1; ISSN JESOA
Country of Publication:
United States
Language:
English