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Title: Magnetic-resonance studies of reactively sputtered amorphous silicon-hydrogen alloys

Technical Report ·
OSTI ID:6599133

Proton magnetic resonance and EPR data are presented for several reactively sputtered amorphous silicon-hydrogen alloys and for a few amorphous silicon-hydrogen-deuterium alloys. Proton NMR absorption measurements are interpreted as evidence for significant inhomogeneity in the local hydrogen density: there is a phase of the material, in which the hydrogen bonded to Si is randomly distributed with average local density 3.39 x 10/sup 21/ cm/sup -3/; there is a hydrogen cluster defect with average local hydrogen density 4.34 x 10/sup 22/ cm/sup -3/; in the lower hydrogen concentration samples there is a third phase of the material which has no H. Proton NMR spin-lattice relaxation measurements as a function of both temperature and H concentration have been interpreted. The mechanism of spin-lattice relaxation in both cases involves spin diffusion to relaxation centers. In the low H concentration samples the relaxation centers are dangling bond electrons, while the centers in the high H samples appear to be three-center Si-H-Si bonds. EPR measurements on the dangling bond electrons are consistent with all of the above conclusions. A new very broad (approx. .1 Tesla) resonance has been detected in all of the samples and is tentatively interpreted in support of the existence of three-center bonds. 33 figures.

Research Organization:
Ames Lab., IA (USA)
DOE Contract Number:
W-7405-ENG-82
OSTI ID:
6599133
Report Number(s):
IS-T-1019; ON: DE83004958
Resource Relation:
Other Information: Thesis
Country of Publication:
United States
Language:
English