Optical properties of In{sub x}Ga{sub 1{minus}x}N alloys grown by metalorganic chemical vapor deposition
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
- Center for Laser and Photonics Research and Department of Physics, Oklahoma State University, Stillwater, Oklahoma 74078 (United States)
- Xerox Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto, California 94304 (United States)
- EMCORE Corporation, 394 Elizobeth Avenue, Somerest, New Jersey 08873 (United States)
We present the results of optical studies of the properties of In{sub x}Ga{sub 1{minus}x}N epitaxial layers (0{lt}x{lt}0.2) grown by metalorganic chemical vapor deposition. The effects of alloying on the fundamental band gap of In{sub x}Ga{sub 1{minus}x}N were investigated using a variety of spectroscopic techniques. The fundamental band-gap energies of the In{sub x}Ga{sub 1{minus}x}N alloys were determined using photomodulation spectroscopy measurements and the variation of the fundamental band gap was measured as a function of temperature. The effects of pressure on the band gap for In{sub x}Ga{sub 1{minus}x}N samples with different alloy concentrations were examined by studying the shift of photoluminescence (PL) emission lines using the diamond-anvil pressure-cell technique. The results show that PL originates from effective-mass conduction-band states. Anomalous temperature dependence of the PL peak shift and linewidth as well as the Stokes shift between photoreflectance and PL lines is explained by composition fluctuations in as-grown InGaN alloys. {copyright} {ital 1998 American Institute of Physics.}
- OSTI ID:
- 659300
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 84; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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