High-temperature oxidation of chemically vapor-deposited silicon nitride in a carbon monoxide-carbon dioxide atmosphere

Journal Article · Tue Nov 01 04:00:00 EST 1994 · Journal of the American Ceramic Society; (United States)

DOI:https://doi.org/10.1111/j.1151-2916.1994.tb04525.x· OSTI ID:6587742

Narushima, Takayuki; Goto, Takashi; Hagiwara, Jun; Iguchi, Yasutaka; Hirai, Toshio ^[1]

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1. Tohoku Univ., Sendai (Japan). Dept. of Metallurgy

Oxidation behavior of chemically vapor-deposited silicon nitride (CVD-Si[sub 3]N[sub 4]) in CO-CO[sub 2] atmospheres between 1,823 and 1,923 K was investigated using a thermogravimetric technique. Mass loss of Si[sub 3]N[sub 4] (active oxidation) was observed in a region of P[sub CO[sub 2]]/P[sub CO] < 1, while mass gain (passive oxidation) was observed at around P[sub CO[sub 2]]/P[sub CO] = 10. In the active oxidation region below P[sub CO[sub 2]]/P[sub CO] = 10[sup [minus]4], carbon particles were formed on the Si[sub 3]N[sub 4] surface as an oxidation product, and the mass-loss rates were independent of P[sub CO[sub 2]]/P[sub CO]. In the active oxidation region above P[sub CO[sub 2]]/P[sub CO] = 10[sup [minus]4], the mass-loss rates decreased with increasing P[sub CO[sub 2]]/P[sub CO]. The critical P[sub CO[sub 2]]/P[sub CO] value from the active to passive oxidation was 2 orders of magnitude larger than the calculated value predicted from the Wagner model.

• OSTI ID: 6587742
• Journal Information: Journal of the American Ceramic Society; (United States), Journal Name: Journal of the American Ceramic Society; (United States) Vol. 77:11; ISSN 0002-7820; ISSN JACTAW
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360205* -- Ceramics
Cermets
&amp; Refractories-- Corrosion &amp; Erosion
CARBON COMPOUNDS
CARBON DIOXIDE
CARBON MONOXIDE
CARBON OXIDES
CHALCOGENIDES
CHEMICAL ANALYSIS
CHEMICAL COATING
CHEMICAL REACTIONS
CHEMICAL VAPOR DEPOSITION
CORROSIVE EFFECTS
DATA
DEPOSITION
EXPERIMENTAL DATA
GRAVIMETRIC ANALYSIS
INFORMATION
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
OXIDATION
OXIDES
OXYGEN COMPOUNDS
PNICTIDES
QUANTITATIVE CHEMICAL ANALYSIS
SAMPLE PREPARATION
SILICON COMPOUNDS
SILICON NITRIDES
SURFACE COATING
THERMAL ANALYSIS
THERMAL GRAVIMETRIC ANALYSIS