Plasma focus sources: Supplement to the neutron resonance radiography workshop proceedings
Conference
·
OSTI ID:6583893
Since their discovery, plasma focus discharges have been recognized as very intense pulsed sources of deuterium-deuterium (D-D) or deuterium-tritium (D-T) fusion-reaction neutrons, with outstanding capabilities. Specifically, the total neutron emission/shot, YN, and the rate of neutron emission, Y/sub n/, of an optimized plasma focus (PF) are higher than the corresponding quantities observed in any other type of pinched discharge at the same level of powering energy W/sub 0/. Recent developments have led to the concept and experimental demonstration of an Advanced Plasma Focus System (APF) that consists of a Mather-geometry plasma focus in which field distortion elements (FDEs) are inserted in the inter-electrode gap for increasing the neutron yield/shot, Y/sub n/. The FDE-induced redistribution of the plasma current increases Y/sub n/ by a factor approx. =5-10 above the value obtained without FDEs under otherwise identical conditions of operation of the plasma focus. For example, an APF that is fed by a fast capacitor bank with an energy, W/sub 0/ = 6kJ, and voltage, V/sub 0/ = 16.5 kV provides Y/sub n/ /congruent/ 4 /times/ 10/sup 9/ D-D neutrons/shot (pure D/sub 2/ filling) and Y/sub n/ = 4 /times/ 10/sup 11/ D-T neutrons/shot (filling is 50% deuterium and 50% tritium). The FDE-induced increase of Y/sub n/ for fixed values of (W/sub 0/, V/sub 0/), the observed scaling law Y/sub n/ /proportional to/ W/sub 0//sup 2/ for optimized plasma focus systems, and our experience with neutron scattering in bulk objects lead us to the conclusion that we can use an APF as a source of high-intensity neutron pulses (10/sup 14/ n/pulse) in the field off neutron radiography (surface and bulk) with a nanosecond or millisecond time resolution.
- Research Organization:
- Los Alamos National Lab., NM (USA)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 6583893
- Report Number(s):
- LA-11393-C-Suppl.; CONF-8707124-Suppl.; ON: DE89006927
- Country of Publication:
- United States
- Language:
- English
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