Electron attachment to photofragments and Rydberg states in laser-irradiated CCl{sub 2}F{sub 2}
- Oak Ridge National Laboratory, P. O. Box 2008, Oak Ridge, Tennessee 37831-6122 (United States)
- Department of Physics, University of Tennessee, Knoxville, Tennessee 37996-1200 (United States)
We report electron attachment measurements on ArF-excimer-laser irradiated CCl{sub 2}F{sub 2}, obtained using an improved experimental technique that allows simultaneous measurements on multiple electron attaching species. Compared to a maximum electron attachment rate constant of {approximately}2{times}10{sup {minus}9}thinspcm{sup 3}thinsps{sup {minus}1} for the ground electronic state of CCl{sub 2}F{sub 2}, we measure an order of magnitude larger rate constant for the CClF{sub 2} radical produced via laser photodissociation. However, the highly excited electronic states of CCl{sub 2}F{sub 2} produced by the laser irradiation have an associated electron attachment rate constant that is at least four orders of magnitude larger compared to the ground electronic state value. Implications of these findings for plasma processing discharges using CCl{sub 2}F{sub 2} are discussed. {copyright} {ital 1998 American Institute of Physics.}
- OSTI ID:
- 657799
- Journal Information:
- Journal of Applied Physics, Vol. 84, Issue 7; Other Information: PBD: Oct 1998
- Country of Publication:
- United States
- Language:
- English
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