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Microstructures of cubic Al sub 2 O sub 3 precipitates in oxygen-implanted aluminum

Conference ·
OSTI ID:6555303

The microstructure of Al ion-implanted at room temperature with 17 at. % 0 has been characterized with TEM. The alloy has extremely small (1.5--3.5 nm) oxide precipitates whose crystal structure is interpreted to be a disordered version of {gamma}-Al{sub 2}O{sub 3} having a fcc lattice of O{sup 2{minus}} ions with Al{sup 3+} ions in random interstitial sites. The small sizes can account for the exceptionally high strength of as-implanted alloys: 2500--3300 MPa. Larger precipitates are found when the alloy is annealed 1/2 hour at 550{degree}C, which is consistent with its somewhat lower strength: 800--1600 MPa. 4 figs.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
Sponsoring Organization:
DOE/DP
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6555303
Report Number(s):
SAND-90-0993C; CONF-900936--7; ON: DE91000038
Country of Publication:
United States
Language:
English