Frequency-stabilized line-narrowed excimer laser source system for high resolution lithography
Patent
·
OSTI ID:6542181
This patent describes an excimer laser source system emitting radiation characterized by a wavelength with a high degree of stability and by a narrow spectral bandwidth. It comprises: a frequency-stabilized reference laser system of a wavelength different from the wavelength of the excimer laser source system; a resonator system stabilized by locking its cavity spacing to the wavelength of the reference laser system; an excimer laser oscillator, another detector and another locking electronics system.
- Assignee:
- NOV; NOV-90-030072; EDB-90-157972
- Patent Number(s):
- A; US 4881231
- Application Number:
- PPN: US s 7-277028
- OSTI ID:
- 6542181
- Country of Publication:
- United States
- Language:
- English
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