Time-resolved x-ray diffraction measurement of the temperature and temperature gradients in silicon during pulsed laser annealing

Journal Article · Tue Feb 01 00:00:00 EST 1983 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.93880· OSTI ID:6541102

Larson, B C; White, C W; Noggle, T S; Barhorst, J F; Mills, D M

Nanosecond resolution time-resolved x-ray diffraction measurements have been used to study the temperature and temperature gradients in <100> and <111> oriented silicon crsytals during pulsed laser annealing. Thermal strain analysis of time-resolved extended Bragg scattering has shown the lattice temperature to reach the melting point during 15-ns, 1.5-J/cm/sup 2/ ruby laser pulses and to remain at the melting point during the high reflectivity phase (HRP). The temperature gradients at the liquid-solid interface were found to be in the range of approx.10/sup 7/ K/cm during the HRP.

• Research Organization: Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
• DOE Contract Number: W-7405-ENG-26
• OSTI ID: 6541102
• Journal Information: Appl. Phys. Lett.; (United States), Vol. 42:3
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
SILICON
ANNEALING
BRAGG REFLECTION
CRYSTAL LATTICES
EXPERIMENTAL DATA
INTERFACES
LASER-RADIATION HEATING
LIQUIDS
ORIENTATION
PULSES
REFLECTIVITY
RUBY LASERS
SOLIDS
STRAINS
TEMPERATURE GRADIENTS
TEMPERATURE MEASUREMENT
TIME RESOLUTION
X-RAY DIFFRACTION
COHERENT SCATTERING
CRYSTAL STRUCTURE
DATA
DIFFRACTION
ELEMENTS
FLUIDS
HEAT TREATMENTS
HEATING
INFORMATION
LASERS
NUMERICAL DATA
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
PLASMA HEATING
REFLECTION
RESOLUTION
SCATTERING
SEMIMETALS
SOLID STATE LASERS
SURFACE PROPERTIES
TIMING PROPERTIES
360605* - Materials- Radiation Effects