Diagnostics of a glow discharge used to produce hydrogenated amorphous silicon films. Final report, February 15, 1980-April 14, 1981
The glow-discharge deposition apparatus, with mass spectrometer sampling, was constructed and tested with Ar and SiH/sub 4/ gas. It successfully achieved the desired high vacuum (approx. 10/sup -8/ Torr), gas flow rates (200 sccm), and mass spectrometer sensitivities (approx. 1 ppM). Ion and neutral species were measured from the end and side of a dc discharge in SiH/sub 4/, finding major changes with sampling position, gas pressure, and discharge power. These observations were explained qualitatively with a discharge model, based on known electrical characteristics of dc discharges combined with available information and some assumptions regarding silane reaction rates. The ion species from a dc-proximity discharge, and from the end and sides of an rf discharge in SiH/sub 4/ were studied. Qualitative comparisons have been made to the dc discharge results and to approximate models for the fields and charge distributions in rf discharges. Impurity concentrations were studied in the vacuum system and silane gases, with sensitivities of less than or equal to 1 ppM outside of mass regions overlain by SiH/sub 4/ ion spectra. The impurity levels attained in the apparatus appear to be entirely due to impurities in the SiH/sub 4/ gas, and are typically at the 1 to 100 ppM level.
- Research Organization:
- Colorado Univ., Boulder (USA)
- DOE Contract Number:
- AC02-77CH00178
- OSTI ID:
- 6487661
- Report Number(s):
- SERI/TR-9053-1-T3
- Country of Publication:
- United States
- Language:
- English
Similar Records
Diagnostics of a glow discharge used to produce amorphous silicon films. Technical progress report, August 15, 1980-November 14, 1980
Diagnostics of a glow discharge used to produce hydrogenated amorphous silicon films. Final subcontract report
Related Subjects
36 MATERIALS SCIENCE
SILANES
GLOW DISCHARGES
SILICON
DEPOSITION
HYDROGENATION
AMORPHOUS STATE
ARGON
IMPURITIES
CHEMICAL REACTIONS
ELECTRIC DISCHARGES
ELEMENTS
FLUIDS
GASES
HYDRIDES
HYDROGEN COMPOUNDS
NONMETALS
RARE GASES
SEMIMETALS
SILICON COMPOUNDS
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