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Pulse radiolysis of gaseous ammonia--oxygen mixtures. [Pulsed irradiation]

Journal Article · · J. Phys. Chem.; (United States)
DOI:https://doi.org/10.1021/j100468a006· OSTI ID:6478467
The effect of oxygen concentration on the decay rates of the radicals NH/sub 2/ and NH was studied using the well-known electronic absorption bands of the two species. We also observed the OH radical being formed with the yield going through a maximum with increasing oxygen concentrations. Due to the possible role of OH as a chain carrier in the system, we investigated the important reaction OH + NH/sub 3/ ..-->.. H/sub 2/O + NH/sub 2/ and found k(OH+NH/sub 3/) = (1.6+-0.2) x (1.6+-0.2) x 10/sup 8/M/sup -1/s/sup -1/ at 300 K and an activation energy of 0.87 +- 0.08 kcal/mol. H atoms are consumed by the reaction H + O/sub 2/ ..-->.. HO/sub 2/, and the transient yield of OH is explained consistently by the reaction H + HO/sub 2/ ..-->.. 2OH with k(H+HO/sub 2/) = 2 x 10/sup 10/M/sup -1/s/sup -1/ in a computer-simulated model. The decay of NH/sub 2/ was found to be independent of the oxygen partial pressure in the range 0-420 mbar at 349 K. A transient species absorbing at 2300 A is formed in NH/sub 3/-O/sub 2/ mixtures. The kinetic features show that the precursor is HO/sub 2/ reacting with NH/sup 3//sub 3/ to form either a hydrogen-bonded complex NH/sub 4/O/sub 2/, or, by water elimination, NHOH. A model for high-dose rate radiolysis of pure gaseous ammonia is proposed. The computer-simulated model, which incorporates N/sub 2/H/sub 3/ as an important intermediate species, is consistent with the observed kinetic features and with the experimental product yields. On the basis of this model we obtained the following rate constants: k(NH/sub 2/+NH/sub 2/) = k(H+NH/sub 2/) = 1.6 x 10/sup 10/M/sup -1/s/sup -1/, k(NH+NH/sub 2/) = 7 x 10/sup 10/m/sup -1/s/sup -1/, and k(N/sub 2/H/sub 3/+N/sub 2/H/sub 3/) = 10/sup 11/M/sup -1/s/sup -1/ at 349 K. 11 figures, 4 tables.
OSTI ID:
6478467
Journal Information:
J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 83:5; ISSN JPCHA
Country of Publication:
United States
Language:
English