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U.S. Department of Energy
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Effect of microstructure on passive film formation and breakdown on al alloys. Final report, 15 December 1988-14 December 1992

Technical Report ·
OSTI ID:6471375
Two in situ techniques, dynamic imaging microellipsometry (DIM) and local impedance spectroscopy (LEIS), were developed and applied to a study of the effect of microstructure on passive film formation and breakdown on Al-Ta alloys. DIM acquires ellipsometric data (thickness and optical constants of the films on surfaces) at a spatial resolution of ca. 20 micrometers using a radiometric full-field imaging approach. LEIS is an electrochemical impedance technique that generates local a.c. impedance data by measuring a.c. solution current densities very near the microstructural features of an electrode surface. The DIM technique was used to look at passive film formation at (a) the Al3Ta precipitate (b) the dealloyed zone adjacent to the precipitate and (c) the solid solution phase that is present in Al-Ta alloys. The DIM technique observed different film thicknesses and optical constants for the films that form on these phases at potentials in the passive regions. The LEIS technique was used to study the precipitate and the region surrounding it under conditions where passive film breakdown occurs. Using these techniques, insight was obtained into the passive film formation and breakdown processes that control localized corrosion.
Research Organization:
Johns Hopkins Univ., Baltimore, MD (United States)
OSTI ID:
6471375
Report Number(s):
AD-A-265339/2/XAB; CNN: N00014-89-J-1180
Country of Publication:
United States
Language:
English