Formation and optical characterization of nanometer dimension colloids in silica formed by sequentially implanting In and Ag

Journal Article · Fri Mar 31 23:00:00 EST 1995 · Journal of Applied Physics; (United States)

DOI:https://doi.org/10.1063/1.358584· OSTI ID:6456974

Magruder, III, R H ^[1]; Zuhr, R A ^[2]

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1. Department of Applied Engineering and Sciences, Vanderbilt University, Nashville, Tennessee 37235 (United States)
2. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (United States)

The optical properties of a series of In then Ag sequentially implanted silica samples are examined as a function of the relative concentrations of implanted In and Ag. The doses used were in ratios, In to Ag, of 9:3, 6:6, and 3:9. Energy of implantation was 320 keV for the In and 305 keV for the Ag. Nominal total doses as determined by current integration for the three samples were 12[times]10[sup 16] (In+Ag) ions/cm[sup 2]. The depth profile of the implanted ions and optical absorption were found to be a function of the relative doses and to differ significantly from samples implanted separately with either In or Ag.

• DOE Contract Number: AC05-84OR21400
• OSTI ID: 6456974
• Journal Information: Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 77:7; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360606* -- Other Materials-- Physical Properties-- (1992-)
ABSORPTION
CHALCOGENIDES
COLLOIDS
COMPOSITE MATERIALS
DISPERSIONS
ELEMENTS
INDIUM
ION IMPLANTATION
MATERIALS
METALS
MINERALS
OPTICAL PROPERTIES
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SILICA
SILICON COMPOUNDS
SILICON OXIDES
SILVER
SORPTION
TRANSITION ELEMENTS