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U.S. Department of Energy
Office of Scientific and Technical Information

Vanadium dioxide formed by the sol-gel process

Patent ·
OSTI ID:6447825
This patent describes a process for the deposition of a crystalline vanadium dioxide thin film. It comprises: providing a solution comprising a vanadium tetraalkoxide and solvent; allowing hydrolysis and condensation reactions to progressively form a homogeneous sol from the solution, applying a coating of the sol to the substrate; allowing a gel to form from the sol on the substrate by evaporating the solvent; dehydrating the gel by heat treatment under an inert atmosphere to form the crystalline vanadium dioxide film.
Assignee:
John Hopkins Univ., Baltimore, MD (USA)
Patent Number(s):
A; US 4957725
Application Number:
PPN: US s 7-215107
OSTI ID:
6447825
Country of Publication:
United States
Language:
English