Absorption and damage thresholds of low defect density hafnia deposited with activated oxygen
Motivation for this work included observations of a correlation between increasing laser damage thresholds and both decreasing nodular-defect density and absorption of coatings. We reduced the nodular-defect densities by a factor of over 4x in hafnia coatings deposited by reactive e-beam evaporation from a Hf target source. In order to increase the metal oxidation kinetics at the coated surface, Hf was e-beam deposited reactively with oxygen activated by a [mu]-wave discharge. The effect of using activated oxygen during the evaporation of a hafnia target source was also evaluated. A series of hafnia layers were made with various conditions; we alternated between two [mu]-wave configurations, hafnium and hafnia targets and two reactive oxygen pressures. Laser damage thresholds (1064 nm -10 ns pulses), absorption (at 511 nm) and nodular-defect densities from these coatings are reported. The damage threshold correlated inversely with the coating absorption.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 6447717
- Report Number(s):
- UCRL-JC-111458; CONF-9210356-1; ON: DE93013853
- Resource Relation:
- Conference: Laser-induced damage in optical materials, Boulder, CO (United States), 28-30 Oct 1992
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
42 ENGINEERING
HAFNIUM OXIDES
DAMAGE
COATINGS
DEFECTS
LASER MATERIALS
LASER RADIATION
LAYERS
CHALCOGENIDES
ELECTROMAGNETIC RADIATION
HAFNIUM COMPOUNDS
MATERIALS
OXIDES
OXYGEN COMPOUNDS
RADIATIONS
REFRACTORY METAL COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
360202* - Ceramics
Cermets
& Refractories- Structure & Phase Studies
426002 - Engineering- Lasers & Masers- (1990-)