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Ion microanalysis and implantation applied to fusion surface research

Conference ·
OSTI ID:6425027
Ion microanalysis and implantation have been used to investigate and analyze plasma-surface interactions relevant to fusion plasma materials. Previous results for pure metals are reviewed and new results are presented for TiB/sub 2/ coatings for Tokamak surfaces. Enhanced trapping of implanted, low-energy hydrogen has been shown to occur at room temperature in W, Au, Pd, Mo, Nb, and TiB/sub 2/ for He or other ion predamage. Hydrogen depth profiles obtained using /sup 1/H(/sup 19/F,..cap alpha gamma..)/sup 16/O resonant nuclear reaction show that the H decorates the He damage profiles at traps whose concentration is proportional to the He-induced damage. For room temperature implantation in TiB/sub 2/, H is trapped at the end of range, and isochronal annealing indicates that the H is lost by release from traps followed by rapid diffusion. For He predamaged samples, annealing at 400/sup 0/C causes the H to be retrapped in the region of the He-induced damage at traps whose cross section is approx. = 1.8 x 10/sup -18/cm/sup 2//trap.
Research Organization:
Sandia Labs., Albuquerque, NM (USA)
DOE Contract Number:
EY-76-C-04-0789
OSTI ID:
6425027
Report Number(s):
SAND-78-1585C; CONF-781113-21
Country of Publication:
United States
Language:
English