Process for recovery of ethylene from gaseous mixture
Patent
·
OSTI ID:6417715
With application of new liquid absorbent, comprised of a compound selected from a group composed of silver halide and cuprous halide, an aluminium halide, a polymer selected from a group composed of styrene and styrene derivatives, and an aromatic hydrocarbon, it is possible to recover ethylene by absorbing ethylene from gaseous mixture containing ethylene such as FCC off gas, ethylene plant off gas and coke oven gas. In particular, said liquid absorbent is neither diluted nor reduced its capability to absorb ethylene by water or its vapor contained in the said gaseous mixture, so the liquid absorbent can be used repeatedly for the recovery of ethylene from gaseous mixture containing ethylene and water or its vapor, without any pretreatment to reduce the water content of said gaseous mixture.
- Assignee:
- Hidefumi Hirai (Japan)
- Patent Number(s):
- US 4525180
- OSTI ID:
- 6417715
- Country of Publication:
- United States
- Language:
- English
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