Interactions of methanol with stoichiometric and defective TiO{sub 2}(110) and (100) surfaces

Journal Article · Tue Sep 01 04:00:00 EDT 1998 · Journal of Vacuum Science and Technology, A

DOI:https://doi.org/10.1116/1.581456· OSTI ID:641612

Wang, L; Ferris, K F ^[1]; Winokur, J P; Shultz, A N ^[2]; Baer, D R; Engelhard, M H ^[3]

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1. Materials and Chemical Sciences Center, Pacific Northwest National Laboratory, Richland, Washington 99352 (United States)
2. Physics Department, Fort Lewis College, Durango, Colorado 81301 (United States)
3. Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99452 (United States)

Interactions of CH{sub 3}OH with stoichiometric (nearly defect-free) and defective TiO{sub 2}(110) and (100) surfaces have been studied using x-ray photoelectron spectroscopy and ultraviolet photoemission spectroscopy. The CH{sub 3}OH saturation coverage was increased by increasing the number of defects created by electron-beam exposure or Ar{sup +} ion bombardment. A small percentage of any defects produced were healed upon the saturation exposure (defect healing means a reduction in defect signal observed by the photoemission measurements). The structural influence on the adsorption and surface defect reactivity was found to be less significant for CH{sub 3}OH than for H{sub 2}O. The CH{sub 3}OH coverages at a given exposure and defect reactivity were comparable for both the (100) and (110) surfaces. {copyright} {ital 1998 American Vacuum Society.}

• OSTI ID: 641612
• Journal Information: Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 5 Vol. 16; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
40 CHEMISTRY
ADSORPTION
ARGON IONS
CRYSTAL DEFECTS
ELECTRON BEAMS
METHANOL
ORGANIC COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
PHOTOEMISSION
REACTIVITY
STOICHIOMETRY
SURFACES
TITANIUM COMPOUNDS
TITANIUM OXIDES