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U.S. Department of Energy
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Thin films of gallium arsenide on low-cost substrates. Quarterly project report No. 3, March 1, 1977-May 31, 1977

Technical Report ·
OSTI ID:6408019

Efforts during this quarter have been directed to: (1) the deposition and characterization of gallium arsenide films on tungsten/graphite, graphite, and germanium (recrystallized)/tungsten/graphite substrates, and (2) the fabrication and characterization of gallium arsenide thin film solar cells. Gallium arsenide films deposited on tungsten/graphite substrates without intentional doping are p-type with net carrier concentrations of 5 x 10/sup 16/ to 10/sup 17/ cm/sup -3/. N-type films with net carrier concentrations of (1 to 3) x 10/sup 17/ cm/sup -3/ have been obtained by using hydrogen sulfide as a dopant. Efforts in obtaining ohmic contacts to these films by using several metals and alloys have not been successful due presumably to the surface oxide. Solar cells have been prepared by using gold as a surface barrier, and AMl efficiencies of up to 2.8% have been obtained for cells of 8 cm/sup 2/ area. This type of solar cell appears to be promising because of its simplicity in fabrication. Gallium arsenide films deposited on graphite substrates were found to have high interface resistance, and solar cells have very low fill factors. A five-zone furnace has been constructed for the deposition of zinc-doped gallium arsenide films. Solar cells have been prepared from gallium arsenide films deposited on germanium (recrystallized)/tungsten/graphite substrates; however, their characteristics are poor.

Research Organization:
Southern Methodist Univ., Dallas, TX (USA)
DOE Contract Number:
AC03-76SF01284
OSTI ID:
6408019
Report Number(s):
DOE/SF/01284-T1; ON: DE81023595
Country of Publication:
United States
Language:
English