Polymethyl methacrylate sensitivity variation versus the electronic stopping power at ion lithography exposure

Journal Article · Mon Jun 15 00:00:00 EDT 1981 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.92244· OSTI ID:6404758

Mladenov, G M; Emmoth, B

Experimental data for the minimum ion dose D/sub 0/ during exposure and for the contrast parameter g are presented. A dependence of D/sub 0/ on the electronic stopping power but no correlation between D/sub 0/ and nuclear stopping power is found. An analogical dependence on minimum absorbed electronic stopping energy density is also found. The absorbed energy density for H/sup +/ ions is comparable with X-ray lithography data but heavier ions are more effective. For the understanding of these relations an electron excitation spike mechanism is suggested. From the non-Rutherford backscattering experiments at 1.7--1.75 MeV the energy losses of protons in polymethyl methacrylate are found to be 25 eV/nm.

• Research Organization: Research Institute of Physics, S-104 05 Stockholm 50, Sweden
• OSTI ID: 6404758
• Journal Information: Appl. Phys. Lett.; (United States), Vol. 38:12
• Country of Publication: United States
• Language: English

Related Subjects

73 NUCLEAR PHYSICS AND RADIATION PHYSICS
HEAVY IONS
STOPPING POWER
HYDROGEN IONS
METHYL METHACRYLATE
CHARGED-PARTICLE TRANSPORT
ABSORPTION
BACKSCATTERING
CORRELATIONS
DATA
ENERGY DENSITY
ENERGY LOSSES
EXCITATION
MATHEMATICAL MODELS
POLYMERS
PROTONS
SENSITIVITY
VARIATIONS
X RADIATION
BARYONS
CARBOXYLIC ACID ESTERS
CHARGED PARTICLES
ELECTROMAGNETIC RADIATION
ELEMENTARY PARTICLES
ENERGY-LEVEL TRANSITIONS
ESTERS
FERMIONS
HADRONS
INFORMATION
IONIZING RADIATIONS
IONS
LOSSES
METHACRYLIC ACID ESTERS
NUCLEONS
ORGANIC COMPOUNDS
RADIATION TRANSPORT
RADIATIONS
SCATTERING
654001* - Radiation & Shielding Physics- Radiation Physics
Shielding Calculations & Experiments