Mechanism of incipient oxidation of bulk chemical vapor deposited Si[sub 3]N[sub 4]
- NASA, Cleveland, OH (United States) Sverdrup Technology Inc., Cleveland, OH (United States)
- NASA, Cleveland, OH (United States) Case Western Reserve Univ., Cleveland, OH (United States)
X-ray photoelectron spectroscopy was employed, in conjunction with ion bombardment, to analyze the chemical composition profile across thin (< 50 nm) oxide films on chemically vapor deposited Si[sub 3]N[sub 4]. The thermal oxides were grown in dry oxygen at 1,100 C on samples with or without native oxide film (formed in room air). The results show that the thermal oxidation product was silicon oxynitride of graded N:O ratio, and that the presence of a native oxide film promoters the formation of a SiO[sub 2] crust over the oxynitride. It is proposed that the fundamental mechanism of Si[sub 3]N[sub 4] oxidation is progressive O-for-N substitution in the silicon oxynitride unit tetrahedron, which is best designated SiN[sub 2[minus]x]O[sub 2+x], where x is also an index of depth. The corresponding equation for nonstoichiometric oxidation of Si[sub 3]N[sub 4] describes a bulk (rather than an interface) reaction process, with significant implications for O[sub 2] and N[sub 2] fluxes and diffusivities.
- OSTI ID:
- 6399054
- Journal Information:
- Journal of the Electrochemical Society; (United States), Vol. 140:3; ISSN 0013-4651
- Country of Publication:
- United States
- Language:
- English
Similar Records
Synthesis, crystal structure and photoluminescence of a new Eu-doped Sr containing sialon (Sr{sub 0.94}Eu{sub 0.06})(Al{sub 0.3}Si{sub 0.7}){sub 4}(N{sub 0.8}O{sub 0.2}){sub 6}
An XPS study on the chemical bond structure at the interface between SiO{sub x}N{sub y} and N doped polyethylene terephthalate
Related Subjects
SILICON NITRIDES
OXIDATION
CHEMICAL COMPOSITION
CHEMICAL REACTION KINETICS
CHEMICAL VAPOR DEPOSITION
ION BEAMS
PHOTOELECTRON SPECTROSCOPY
SILICON OXIDES
X-RAY SPECTROSCOPY
BEAMS
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL REACTIONS
DEPOSITION
ELECTRON SPECTROSCOPY
KINETICS
NITRIDES
NITROGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PNICTIDES
REACTION KINETICS
SILICON COMPOUNDS
SPECTROSCOPY
SURFACE COATING
360205* - Ceramics
Cermets
& Refractories- Corrosion & Erosion