Pore structure characterization of thin films using a surface acoustic wave/volumetric adsorption technique

Journal Article · Fri Jan 01 04:00:00 EST 1993 · Langmuir; (United States)

DOI:https://doi.org/10.1021/la00025a047· OSTI ID:6397648

Hietala, S L; Smith, D M ^[1]; Hietala, V M; Frye, G C; Martin, S J ^[2]

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1. Univ. of New Mexico, Albuquerque (United States)
2. Sandia National Laboratories, Albuquerque, NM (United States)

A surface acoustic wave/volumetric adsorption technique is employed to elucidate pore size, pore size distribution, and surface area of inorganic thin films. The technique has been adapted to a commercial bulk sample adsorption analyzer in order to span the characterization of nonporous, microporous, and mesoporous thin films. Nitrogen adsorption was measured on an uncoated surface-acoustic wave device, a mesoporous silica thin film, and a microporous silica thin film. In addition, carbon dioxide adsorption at several temperatures (196 K, 273 K) was used to probe the microporous silica thin film. Data are analyzed by commonly-used gas adsorption data reduction techniques including the BET, Kelvin/BJH, and Dubinin-Radushkevich. 9 refs., 6 figs.

• OSTI ID: 6397648
• Journal Information: Langmuir; (United States), Journal Name: Langmuir; (United States) Vol. 9:1; ISSN LANGD5; ISSN 0743-7463
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360602* -- Other Materials-- Structure & Phase Studies
ADSORPTION
CARBON COMPOUNDS
CARBON DIOXIDE
CARBON OXIDES
CHALCOGENIDES
CRYSTAL STRUCTURE
ELEMENTS
FILMS
MICROSTRUCTURE
NITROGEN
NONMETALS
OXIDES
OXYGEN COMPOUNDS
POROSITY
SILICON COMPOUNDS
SILICON OXIDES
SORPTION
SOUND WAVES
SURFACE AREA
SURFACE PROPERTIES
THIN FILMS