Simulations of BCl{sub 3}/Cl{sub 2}/Ar plasmas with comparisons to diagnostic data

Journal Article · Wed Jul 01 04:00:00 EDT 1998 · Journal of Vacuum Science and Technology, A

DOI:https://doi.org/10.1116/1.581332· OSTI ID:638759

Meeks, E ^[1]; Ho, P ^[2]; Ting, A ^[1]; Buss, R J ^[2]

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1. Sandia National Laboratories, Livermore, California 94551-0969 (United States)
2. Sandia National Laboratories, Albuquerque, New Mexico 87185-5800 (United States)

A reaction mechanism is reported that describes BCl{sub 3}/Cl{sub 2}/Ar plasmas used in the etching of metal lines in microelectronics fabrication processes. Although many of the fundamental electron-impact cross sections for this system are not well known, a reasonable set of reaction paths and rate coefficients has been derived to describe low-pressure reactors with high plasma density. The reaction mechanism describes 59 possible gas-phase events and 18 plasma-surface interactions. A well-mixed reactor model is used to develop the reaction set and to test it against absolute experimental measurements of electron and Cl{sup {minus}} densities, as well as relative measurements of BCl and Cl radicals in an inductively coupled research reactor. The experimental data cover a wide range of operating conditions and gas mixtures. The model provides quantitative agreement with measurements over the whole range of conditions and diagnostics, capturing most of the observed trends. In addition, the model predicts relative ion ratios and Cl/Cl{sub 2} density ratios as measured by molecular beam mass spectrometry. Comparisons of results from the zero-dimensional model and a two-dimensional continuum plasma model, using the same reaction mechanisms, further validate the chemistry set and show the strengths and weaknesses of the well-stirred reactor approach. Sensitivity analysis shows the dominant reactions contributing to model predictions of species densities. {copyright} {ital 1998 American Vacuum Society.}

• OSTI ID: 638759
• Journal Information: Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 4 Vol. 16; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ARGON
BORON CHLORIDES
BORON COMPOUNDS
CHEMICAL REACTIONS
CHLORINE
MASS SPECTRA
MICROELECTRONICS
PLASMA DENSITY
PLASMA DIAGNOSTICS
PLASMA SIMULATION
REACTION KINETICS
SURFACE TREATMENTS