rf plasma synthesis of ultrafine, ultrapure silicon carbide powder

Conference · Sat Jan 01 04:00:00 EST 1983

OSTI ID:6386757

Hollabaugh, C M; Hull, D E; Newkirk, L R; Petrovic, J J

Ultrafine, ultrapure silicon carbide powder has been produced by reaction of silane and methane in a high temperature rf plasma. Preliminary studies include the effect of gas composition and of powder (plasma temperature) on the stoichiometry of the powder. The carbon-to-silicon ratio of the powder was varied from 1.0 to 1.9 by changing the process conditions. The powder has a BET surface area of 101 m/sup 2//g, which is equivalent to a particle diameter of 18.5 nm. A particle size in the range of 10 to 20 nm was measured by transmission electron microscopy. X-ray diffraction results indicate a domain size of 7.5 nm and a crystal structure of beta (cubic) silicon carbide. Spectrographic analysis shows that metallic impurities are lower than high quality grade commercial powder. Because of the high surface area, the powder must be stored and processed in an inert atmosphere to prevent severe contamination with oxygen.

• Research Organization: Los Alamos National Lab., NM (USA)
• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 6386757
• Report Number(s): LA-UR-83-367; CONF-830215-2; ON: DE83007551
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
ALKANES
CARBIDES
CARBON COMPOUNDS
COHERENT SCATTERING
CRYSTAL STRUCTURE
DIFFRACTION
HYDRIDES
HYDROCARBONS
HYDROGEN COMPOUNDS
METHANE
ORGANIC COMPOUNDS
PARTICLE SIZE
PLASMA
POWDERS
SCATTERING
SILANES
SILICON CARBIDES
SILICON COMPOUNDS
SIZE
SURFACE AREA
SURFACE PROPERTIES
SYNTHESIS
X-RAY DIFFRACTION