skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: 18% efficient silicon photovoltaic devices by rapid thermal diffusion and oxidation

Journal Article · · IEEE Transactions on Electron Devices
DOI:https://doi.org/10.1109/16.704369· OSTI ID:638406
;  [1]
  1. Georgia Inst. of Tech., Atlanta, GA (United States)

For the first time, cells formed by rapid thermal processing (RTP) have resulted in 18%-efficient 1 and 4 cm{sup 2} single-crystal silicon solar cells. Front surface passivation by rapid thermal oxidation (RTO) significantly enhanced the short wavelength response and decreased the effective front surface recombination velocity (including contact effects) from 7.5 {times} 10{sup 5} to about 2 {times} 10{sup 4} cm/s. This improvement resulted in an increase of about 1% (absolute) in energy conversion efficiency, up to 20 mV in V{sub oe}, and about 1 mA/cm{sup 2} in J{sub sc}. These RTO-induced enhancements are shown to be consistent with model calculations. Since only 3 to 4 min are required to simultaneously form the phosphorus emitter and aluminum back-surface-field (BSF) and 5 to 6 min are required for growing the RTO, this RTP/RTO process represents the fastest technology for diffusing and oxidizing {ge} 18%-efficient solar cells. Both cycles incorporate an in situ anneal lasting about 1.5 min to preserve the minority carrier lifetime of lower quality materials such as dendritic-web and multicrystalline silicon. These high-efficiency cells confirmed that RTP results in equivalent performance to cells fabricated by conventional furnace processing (CFP). Detailed characterization and modeling reveals that because of RTO passivation of the front surface (which reduced J{sub oe} by nearly a factor of ten), these RTP/RTO cells have become base dominated (J{sub ob} {much_gt} J{sub o}), and further improvement in cell efficiency is possible by a reduction in back surface recombination velocity (BSRV). Based upon model calculations, decreasing the BSRV to 200 cm/s is expected to give 20%-efficient RTP/RTO cells.

OSTI ID:
638406
Journal Information:
IEEE Transactions on Electron Devices, Vol. 45, Issue 8; Other Information: PBD: Aug 1998
Country of Publication:
United States
Language:
English

Similar Records

Characterization and application of rapid thermal oxide surface passivation for the highest efficiency RTP silicon solar cells
Book · Wed Dec 31 00:00:00 EST 1997 · OSTI ID:638406

Understanding and implementation of rapid thermal technologies for high-efficiency silicon solar cells
Journal Article · Fri Oct 01 00:00:00 EDT 1999 · IEEE Transactions on Electron Devices (Institute of Electrical and Electronics Engineers) · OSTI ID:638406

Gettering and passivation of high efficiency multicrystalline silicon solar cells
Journal Article · Sat Feb 01 00:00:00 EST 1997 · AIP Conference Proceedings · OSTI ID:638406