Regime of very high confinement in the boronized DIII-D tokamak
Journal Article
·
· Physical Review Letters; (United States)
Following boronization, tokamak discharges in DIII-D have been obtained with confinement times up to a factor of 3.5 above the ITER89-P {ital L}-mode scaling and 1.8 times greater than the DIII-D/JET {ital H}-mode scaling relation. Very high confinement phases are characterized by relatively high central density with {ital n}{sub {ital e}}(0){approx}1{times}10{sup 20} m{sup {minus}3}, and central ion temperatures up to 13.6 keV at moderate plasma currents (1.6 MA) and heating powers (12.5--15.3 MW). These discharges exhibit a low fraction of radiated power, {ital P}{le}25%, {ital Z}{sub {ital e}{ital f}{ital f}}(0) close to unity, and lower impurity influxes than comparable DIII-D discharges before boronization.
- DOE Contract Number:
- AC03-89ER51114
- OSTI ID:
- 6379696
- Journal Information:
- Physical Review Letters; (United States), Journal Name: Physical Review Letters; (United States) Vol. 67:22; ISSN PRLTA; ISSN 0031-9007
- Country of Publication:
- United States
- Language:
- English
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Very high confinement discharges in DIII-D after boronization
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Journal Article
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Wed Jul 01 00:00:00 EDT 1992
· Physics of Fluids B; (United States)
·
OSTI ID:7034337
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Conference
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Fri May 01 00:00:00 EDT 1992
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OSTI ID:10162242
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OSTI ID:7205588
Related Subjects
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700310* -- Plasma Confinement-- (1992-)
700412 -- Magnetic Confinement Devices-- (1992-)
BORON
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CLOSED PLASMA DEVICES
CONFINEMENT
DATA
DEPOSITION
ELECTRIC DISCHARGES
ELECTRON TEMPERATURE
ELEMENTS
EXPERIMENTAL DATA
FILMS
FLUID MECHANICS
HYDRODYNAMICS
IMPURITIES
INFORMATION
INSTABILITY
ION TEMPERATURE
MAGNETOHYDRODYNAMICS
MECHANICS
NUMERICAL DATA
PLASMA
PLASMA CONFINEMENT
PLASMA DENSITY
PLASMA INSTABILITY
SCALING LAWS
SEMIMETALS
SURFACE COATING
THERMONUCLEAR DEVICES
THIN FILMS
TIME DEPENDENCE
TOKAMAK DEVICES
700310* -- Plasma Confinement-- (1992-)
700412 -- Magnetic Confinement Devices-- (1992-)
BORON
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CLOSED PLASMA DEVICES
CONFINEMENT
DATA
DEPOSITION
ELECTRIC DISCHARGES
ELECTRON TEMPERATURE
ELEMENTS
EXPERIMENTAL DATA
FILMS
FLUID MECHANICS
HYDRODYNAMICS
IMPURITIES
INFORMATION
INSTABILITY
ION TEMPERATURE
MAGNETOHYDRODYNAMICS
MECHANICS
NUMERICAL DATA
PLASMA
PLASMA CONFINEMENT
PLASMA DENSITY
PLASMA INSTABILITY
SCALING LAWS
SEMIMETALS
SURFACE COATING
THERMONUCLEAR DEVICES
THIN FILMS
TIME DEPENDENCE
TOKAMAK DEVICES